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Please use this identifier to cite or link to this item: http://hdl.handle.net/1807/23558


Title: Gamma Rays and Ethylmethane Sulphonate In Vitro Induced Fusarium Wilt Resistant Mutants in Bananas
Issue Date: 31-Dec-1999
Publisher: African Crop Science Society
Citation: African Crop Science Journal (ISSN: 1021-9730) Vol 7 Num 4
Abstract: African Crop Science Journal, Vol. 7. No. 4, pp. 313-320, 1999 Gamma Rays and Ethylmethane Sulphonate In Vitro Induced Fusarium Wilt Resistant Mutants in Bananas Code Number: CS99020 ABSTRACT: Shoot-tips of five different banana and plantain genomes: dessert bananas (Sukalindizi (AB), Gros Michel (AAA), French Plantain (ABB), Kayinja (AAB) and Mbwazirume (AAA-EA) were exposed to 60Co gamma irradiation of 20, 30, 40 Gy at a dose rate of 0.8 Gy min-1. This was followed by different doses for each cultivar as follows: 32, 34, 36, 38 Gy for Gros Michel, 36, 38, 40, 42 Gy for French Plantain, 38, 40, 42 Gy for Kayinja, 32, 34, 36, 38 Gy for Mbwazirume and 27, 30, 32 for Sukalindizi. Radiosensitivity was assessed by determining the growth rate as indicated by fresh weight of cultures 30 days after irradiation. The LD50s for cultivars estimated using relative growth rate and SAS computer programme were found to be cultivar dependent. A similar batch of shoot-tips was exposed to ethylmethane sulphonate (EMS) with concentrations (v/v) of 0.05%, 0.15%, 0.2%, 0.25%, 0.35%, 0.4% and 0.6% for three hours. The LD50s were similarly determined and found to be cultivar dependent. Direct exposure of in vitrobanana plantlets to Oxysporium fsp cubense conidial suspensions suggested that in vitro conditions weakens the resistance of the plantlets to the fungus when compared to older plantlets in the screenhouse. KEYWORDS: Gamma irradiation, lethal dose (LD50),mutagenesis, Musa Copyright 1999, African Crop Science Society
URI: http://hdl.handle.net/1807/23558
Other Identifiers: http://www.bioline.org.br/abstract?id=cs99020
Rights: Copyright 1999 African Crop Science Society
Appears in Collections:Bioline International Legacy Collection

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